--- title: "Chinese breakthrough in EUV lithography: how a former ASML engineer helped Beijing create its own light source" description: "🇨🇳 China has created its own EUV light source for lithography! 🚀 Helped by former ASML engineer Lin Nian. Efficiency 3.42% — currently too low for mass production, but a step forward! ⚡️ Western sanctions did not stop Beijing. #China #EUV #ASML #Chips #Technology" date: 2026-08-11T23:12:22.000Z lang: en url: https://xab.info/en/posts/china-developed-key-component-for-sovereign-euv-lithography-helped-by-former-asml-engineer tags: [china, semiconductor, euv-lithography, asml, lin-nan, chip-production, technology-sanctions] publisher: "XAB.info" --- # Chinese breakthrough in EUV lithography: how a former ASML engineer helped Beijing create its own light source ![EUV lithography system with purple radiation, symbolizing China’s breakthrough in developing its own radiation source with the help of a former ASML engineer](https://xab.info/media/2026/08/12/kitaj-razrabotal-kluchevoy-komponent-dlya-suverennoy-euv-litografii-pomog-byvshiy-inzhener-asml/kitaj-razrabotal-kluchevoy-komponent-dlya-suverennoy-euv-litografii-pomog-byvshiy-inzhener-asml-1.webp) ## 🎯 Key Points - China created an EUV light source with 3.42% efficiency - Former ASML engineer Lin Nian helped in the development - Source power is 100–150 W compared to 600 W at ASML - A full-fledged scanner is possible no earlier than 2028–2030 - Western sanctions stimulate Chinese technological sovereignty In August 2026, the Chinese semiconductor industry took another step towards technological sovereignty. Researchers from the PRC successfully created a laser light source in the extreme ultraviolet (EUV) range — a key component for lithography scanners necessary for producing chips with nodes smaller than 7 nm. This achievement was made possible thanks to the involvement of Lin Nian, a former engineer at the Dutch company ASML, who, according to Newsbit, transferred his knowledge to Chinese developers. ### Technological breakthrough and its limitations The EUV light source created by Chinese scientists demonstrates an energy conversion efficiency into useful radiation of 3.42%. Although this figure is considered acceptable for experimental setups, it is significantly inferior to modern serial systems, which output about 600 W of power. For comparison, ASML plans to increase the power of its sources to 1000 W, which will allow for increased chip production throughput. The Chinese prototype currently operates in the range of 100–150 W, making it unsuitable for mass production. ### Lin Nian's role and technology transfer Lin Nian, who worked at ASML in the Netherlands, specialized in the development of lasers for EUV systems. His participation in the Chinese project was a decisive factor in creating the light source. However, as experts note, the source alone is not enough to create a full-fledged EUV scanner. Complex mirror systems, precision actuators, and specialized software are required, which are currently still in the development stage in China. ### Contradictory data There are disagreements regarding the actual capabilities of the Chinese EUV system. According to Reuters, prototypes of scanners of Chinese development do not yet possess sufficiently high-quality optics, which casts doubt on their operability in industrial conditions. Some sources suggest that the Chinese will be able to create a full-fledged EUV scanner no earlier than 2028 or even 2030. At the same time, other experts believe that current achievements already indicate serious progress and may accelerate the time to market. ### Geopolitical context and sanctions Supplies of EUV equipment to China were banned as early as 2019 at the initiative of the Dutch authorities, where ASML's headquarters is located. Later, this initiative was supported by US authorities, seeking to limit the technological development of the PRC. As a result, the Chinese semiconductor industry is forced to rely on its own strength, making the creation of its own EUV light source a strategically important achievement. ### Prospects and challenges Despite successes, the Chinese industry still has to overcome many challenges. Creating a full-fledged EUV scanner requires not only a powerful light source but also high-precision optics, precision actuators, and complex software. In addition, it is necessary to ensure the stability and reliability of the system's operation under mass production conditions. Experts believe that China will be able to achieve these goals in the next 2–4 years, but competition with Western manufacturers will remain fierce. ## 🔍 Fact-Check Verification - [Former ASML engineers secretly built an EUV lithography prototype in China — it works, but chips are not yet ...](https://3dnews.ru/1134074/bivshie-ingeneri-asml-tayno-postroili-v-kitae-prototip-euvlitografa-on-rabotaet-no-chipi-poka-ne-delaet) - Подтверждает создание источника EUV-излучения и участие Линя Наня. - [Testing of China's own EUV lithography machine has begun](https://overclockers.ru/blog/goldas/show/245785/V-Kitae-startovalo-testirovanie-sobstvennoj-mashiny-dlya-EUV-litografii) - Подтверждает тестирование прототипа EUV-установки в Китае. - [The US suspects that China may have received advanced EUV equipment from Europe](https://www.ixbt.com/live/offtopic/ssha-podozrevayut-chto-kitay-mog-poluchit-peredovoe-euv-oborudovanie-ot-evropy.html) - Подтверждено по источнику ixbt.com - [China created a prototype EUV installation for chip production](https://overclockers.ru/blog/Global_Chronicles/show/245853/Kitaj-sozdal-prototip-EUV-ustanovki-dlya-proizvodstva-chipov) - Подтверждает тестирование прототипа EUV-установки в Китае. ## ❓ FAQ ### Q: What is EUV lithography? **A:** EUV lithography is a technology for manufacturing semiconductor chips using extreme ultraviolet radiation to create microscopic structures on silicon wafers. ### Q: Why did China create its own EUV light source? **A:** Due to Western sanctions banning the supply of EUV equipment to China, Beijing is forced to develop its own technologies to ensure technological sovereignty. ### Q: Who is Lin Nian? **A:** Lin Nian is a former ASML engineer who specialized in developing lasers for EUV systems. He helped Chinese researchers create an EUV light source. ### Q: When will China be able to create a full-fledged EUV scanner? **A:** Experts suggest that the Chinese will be able to create a full-fledged EUV scanner no earlier than 2028–2030, depending on progress in the development of optics and software.