Chinese breakthrough in EUV lithography: how a former ASML engineer helped Beijing create its own light source
🇨🇳 China has created its own EUV light source for lithography! 🚀 Helped by former ASML engineer Lin Nian. Efficiency 3.42% — currently too low for mass production, but a step forward! ⚡️ Western sanctions did not stop Beijing. #China #EUV #ASML #Chips #Technology
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